Title

Chemical Vapor Deposition Of Novel Carbon Materials

Abstract

Nanocrystalline diamond thin films have been prepared using hot filament CVD technique with a mixture of CH4/H2/Ar as the reactant gas. We demonstrated that the ratio of H2 to Ar in the reactant gas plays an important role in control of the grain size of diamonds and the growth of the nanocrystalline diamonds. In addition, we have investigated the growth of carbon nanotubes from catalytic CVD using a hydrocarbon as the reactant gas. Furthermore, focused ion beam technique has been developed to control the growth of carbon nanotubes individually.

Publication Date

6-15-2000

Publication Title

Thin Solid Films

Volume

368

Issue

2

Number of Pages

193-197

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.1016/S0040-6090(00)00763-X

Socpus ID

0033703591 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0033703591

This document is currently not available here.

Share

COinS