Title

Effect of refractive index mismatch on multi-photon direct laser writing

Authors

Authors

H. E. Williams; Z. Y. Luo;S. M. Kuebler

Comments

Authors: contact us about adding a copy of your work at STARS@ucf.edu

Abbreviated Journal Title

Opt. Express

Keywords

3-DIMENSIONAL PHOTONIC CRYSTALS; HIGH-ASPECT-RATIO; SPHERICAL-ABERRATION; ELECTROMAGNETIC DIFFRACTION; 2-PHOTON; POLYMERIZATION; FABRICATION; SU-8; PHOTORESIST; GLASS; MICROFABRICATION; Optics

Abstract

This work reports how the process of three-dimensional multi-photon direct laser writing (mpDLW) is affected when there is a small mismatch in refractive index between the material being patterned and the medium in which the focusing objective is immersed. Suspended-line microstructures were fabricated by mpDLW in the cross-linkable epoxide SU-8 as a function of focus depth and average incident power. It is found that even a small refractive index contrast of Delta n = +0.08 causes significant variation in feature width and height throughout the depth of the material. In particular, both the width and height of features can either increase or decrease with depth, depending upon how much the average incident laser power exceeds the threshold for writing. Vectorial diffraction theory is used to obtain insight into the origin of the effect and how to compensate for it. We demonstrate that varying the average focused power is a practical means for controlling the variation in feature size with focal depth. (C) 2012 Optical Society of America

Journal Title

Optics Express

Volume

20

Issue/Number

22

Publication Date

1-1-2012

Document Type

Article

Language

English

First Page

25030

Last Page

25040

WOS Identifier

WOS:000310443400095

ISSN

1094-4087

Share

COinS