Authors

J. Xie;A. Kar

Comments

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Abbreviated Journal Title

J. Appl. Phys.

Keywords

RADIATION; SURFACE; Physics, Applied

Abstract

Large-area film removal with lasers is a physical process of melting and vaporization of films. A mathematical model is developed to simulate the melting and vaporization of films under the irradiation of a chemical oxygen-iodine laser. The cross section of the film after laser scanning and the substrate surface temperature during laser irradiation are presented. There is an optimum laser power at which relatively wide films can be removed by maintaining low temperature at the substrate surface. The optimum laser power is associated with other process parameters. The results of film removal with TEM31 and TEM00 beams are compared, and the laser mode with more uniform intensity distribution is found to be more effective for large-area film removal. (C) 1997 American Institute of Physics.

Journal Title

Journal of Applied Physics

Volume

82

Issue/Number

10

Publication Date

1-1-1997

Document Type

Article

Language

English

First Page

4744

Last Page

4751

WOS Identifier

WOS:A1997YG47300006

ISSN

0021-8979

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