Abbreviated Journal Title
Appl. Phys. Lett.
OXIDE THIN-FILMS; NICMG1-CO SOLID-SOLUTIONS; NICKEL-OXIDE; OPTICAL-PROPERTIES; BAND-GAP; MGXZN1-XO; PHOTOCONDUCTIVITY; ABSORPTION; ALLOY; NIO; Physics, Applied
Deep-ultraviolet (DUV) photodetectors were fabricated from high quality NixMg1-xO epitaxially grown by plasma-assisted molecular beam epitaxy on an approximately lattice matched MgO < 100 > substrate. A mid-range Ni composition (x=0.54) NixMg1-xO film was grown for DUV (lambda(peak) < 300 nm) photoresponse and the film was characterized by reflected high-energy electron diffraction, Rutherford backscattering spectroscopy, x-ray diffraction, and optical transmission measurements. Photoconductive detectors were then fabricated by deposition of symmetric interdigitated contacts (10 nm Pt/150 nm Au) with contact separations of 5, 10, and 15 mu m. The detectors exhibited peak responsivities in the DUV (lambda(peak) approximate to 250 nm) as high as 12 mA/W, low dark currents (I-dark < 25 nA), and DUV:visible ejection ratio of approximately 800:1.
Applied Physics Letters
Mares, J. W.; Boutwell, R. C.; Wei, M.; Scheurer, A.; and Schoenfeld, W. V., "Deep-ultraviolet photodetectors from epitaxially grown NixMg1-xO" (2010). Faculty Bibliography 2010s. 507.