Title
Liquid Sprays As the Target for a Laser Plasma EUV Light Source (EU)
Abstract
A laser-plasma EUV radiation source that generates larger liquid droplets for the plasma target material. The EUV source forces a liquid, preferably Xenon, through a nozzle , instead of forcing a gas through the nozzle. The geometry of the nozzle and the pressure of the liquid through the nozzle atomizes the liquid to form a dense spray of droplets. Because the droplets are formed from a liquid, they are larger in size, and are more conducive to generating EUV radiation. A condenser is used to convert gaseous Xenon to the liquid prior to being forced through the nozzle.
Document Type
Patent
Patent Number
EP 1 182 912
Application Serial Number
1117689.8
Issue Date
2-25-2009
Current Assignee
Agency: University of Central Florida Foundation, Inc.
Assignee at Issuance
Agency: University of Central Florida Foundation, Inc.
Filing Date
7-26-2001
Assignee at Filing
Agency: TRW Inc.
Filing Type
Foreign Filing Record
Donated
yes
Recommended Citation
McGregor, Roy; Orsini, Rocco; and Petach, Michael, "Liquid Sprays As the Target for a Laser Plasma EUV Light Source (EU)" (2009). UCF Patents. 304.
https://stars.library.ucf.edu/patents/304