Abstract
An EUV radiation source that creates a stable solid filament target. The source includes nozzle assembly having a condenser chamber for cryogenically cooling a gaseous target material into a liquid state. The liquid target material is filtered by a filter and sent to a holding chamber under pressure. The holding chamber allows entrained gas bubbles in the target being emitted from the nozzle assembly. The target material is forced through a nozzle outlet tube to be emitted from the nozzle assembly as a liquid target stream. A thermal shield is provided around the outlet tube to maintain the liquid target material in the cryogenic state. The liquid target stream freezes and is vaporized by a laser beam from a laser source to generate the EUV radiation.
Document Type
Patent
Patent Number
US 6,835,944
Application Serial Number
10/269,760
Issue Date
12-28-2004
Current Assignee
Joint Assignment w/UCFRF
Assignee at Issuance
UCFRF
Allowance Date
8-13-2004
Filing Date
10-11-2002
Assignee at Filing
Agency: TRW Inc.
Filing Type
Nonprovisional Application Record
Donated
yes
Recommended Citation
Fornaca, Steven; McGregor, Roy; Michaelian, Mark; Orsini, Rocco; Petach, Michael; and Shields, Henry, "Low Vapor Pressure, Low Debris Solid Target for EUV Production." (2004). UCF Patents. 308.
https://stars.library.ucf.edu/patents/308