Thickness dependence of the magnetic hysteresis of NiFe-31% films as a function of an applied isotropic in-plane stress
Abbreviated Journal Title
J. Appl. Phys.
SPIN VALVES; THIN-FILMS; INPLANE; NI; Physics, Applied
The magnetic hysteresis of dc magnetron-sputtered Ni69Fe31 films that were sandwiched between titanium layers was investigated as a function of an externally applied isotropic in-plane strain. The hysteresis curves were measured with a Kerr magnetometer that monitored the longitudinal Kerr ellipticity as a function of the in-plane magnetic field. The strain was created by bending the samples in two dimensions using a pressure cell. Measurements were performed on films with different thicknesses. The magnetoelastic properties appeared to be much smaller for films with a thickness of 100 nm than for films with a thickness of 288 or 500 nm. This might be due to a change of the domain wall pinning, or a change of the domain wall density as a function of the film thickness. Measurements under compressive isotropic in-plane stress were shown to be possible by flipping the sample in the pressure holder and measuring through the glass substrate. The Faraday effect and stress-induced birefringence in the glass substrate did not hinder the accumulation of noiseless hysteresis data. The magnetoelastic effects appeared to be different for positive and negative values of the applied stress. (C) 2003 American Institute of Physics.
Journal of Applied Physics
"Thickness dependence of the magnetic hysteresis of NiFe-31% films as a function of an applied isotropic in-plane stress" (2003). Faculty Bibliography 2000s. 3772.