Abbreviated Journal Title
J. Appl. Phys.
Keywords
SPIN VALVES; THIN-FILMS; INPLANE; NI; Physics, Applied
Abstract
The magnetic hysteresis of dc magnetron-sputtered Ni69Fe31 films that were sandwiched between titanium layers was investigated as a function of an externally applied isotropic in-plane strain. The hysteresis curves were measured with a Kerr magnetometer that monitored the longitudinal Kerr ellipticity as a function of the in-plane magnetic field. The strain was created by bending the samples in two dimensions using a pressure cell. Measurements were performed on films with different thicknesses. The magnetoelastic properties appeared to be much smaller for films with a thickness of 100 nm than for films with a thickness of 288 or 500 nm. This might be due to a change of the domain wall pinning, or a change of the domain wall density as a function of the film thickness. Measurements under compressive isotropic in-plane stress were shown to be possible by flipping the sample in the pressure holder and measuring through the glass substrate. The Faraday effect and stress-induced birefringence in the glass substrate did not hinder the accumulation of noiseless hysteresis data. The magnetoelastic effects appeared to be different for positive and negative values of the applied stress.
Journal Title
Journal of Applied Physics
Volume
93
Issue/Number
10
Publication Date
1-1-2003
Document Type
Article
DOI Link
Language
English
First Page
8624
Last Page
8626
WOS Identifier
ISSN
0021-8979
Recommended Citation
Garrett, Claude; Holland, Patrick; Geerts, Wilhelmus J.; Ragan, Dustin; Dubey, Archana; Rios, Steve; and Bandyopadhyay, Anup K., "Thickness dependence of the magnetic hysteresis of NiFe-31% films as a function of an applied isotropic in-plane stress" (2003). Faculty Bibliography 2000s. 3772.
https://stars.library.ucf.edu/facultybib2000/3772