Studies of high-repetition-rate laser plasma EUV sources from droplet targets
Abbreviated Journal Title
Appl. Phys. A-Mater. Sci. Process.
X-RAY-LITHOGRAPHY; Materials Science, Multidisciplinary; Physics, Applied
The water droplet laser plasma source has been shown to have many attractive features as a continuous, almost debris-free source for extreme ultraviolet (EUV) and X-ray applications. Through a dual experimental and theoretical study, we analyze the interaction physics between the laser light and the target. The hydrodynamic laser plasma simulation code, Medusa103 is used to model the electron density distribution for comparison to electron density distributions obtained through Abel inversion of plasma interferograms. In addition, flat field EUV spectra are compared to synthetic spectra calculated with the atomic physics code RATION.
Applied Physics a-Materials Science & Processing
"Studies of high-repetition-rate laser plasma EUV sources from droplet targets" (2003). Faculty Bibliography 2000s. 3851.