Studies of high-repetition-rate laser plasma EUV sources from droplet targets

    Authors

    C. Keyser; G. Schriever; M. Richardson;E. Turcu

    Comments

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    Abbreviated Journal Title

    Appl. Phys. A-Mater. Sci. Process.

    Keywords

    X-RAY-LITHOGRAPHY; Materials Science, Multidisciplinary; Physics, Applied

    Abstract

    The water droplet laser plasma source has been shown to have many attractive features as a continuous, almost debris-free source for extreme ultraviolet (EUV) and X-ray applications. Through a dual experimental and theoretical study, we analyze the interaction physics between the laser light and the target. The hydrodynamic laser plasma simulation code, Medusa103 is used to model the electron density distribution for comparison to electron density distributions obtained through Abel inversion of plasma interferograms. In addition, flat field EUV spectra are compared to synthetic spectra calculated with the atomic physics code RATION.

    Journal Title

    Applied Physics a-Materials Science & Processing

    Volume

    77

    Issue/Number

    2

    Publication Date

    1-1-2003

    Document Type

    Article

    Language

    English

    First Page

    217

    Last Page

    221

    WOS Identifier

    WOS:000183444500007

    ISSN

    0947-8396

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