Title

Studies of high-repetition-rate laser plasma EUV sources from droplet targets

Authors

Authors

C. Keyser; G. Schriever; M. Richardson;E. Turcu

Comments

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Abbreviated Journal Title

Appl. Phys. A-Mater. Sci. Process.

Keywords

X-RAY-LITHOGRAPHY; Materials Science, Multidisciplinary; Physics, Applied

Abstract

The water droplet laser plasma source has been shown to have many attractive features as a continuous, almost debris-free source for extreme ultraviolet (EUV) and X-ray applications. Through a dual experimental and theoretical study, we analyze the interaction physics between the laser light and the target. The hydrodynamic laser plasma simulation code, Medusa103 is used to model the electron density distribution for comparison to electron density distributions obtained through Abel inversion of plasma interferograms. In addition, flat field EUV spectra are compared to synthetic spectra calculated with the atomic physics code RATION.

Journal Title

Applied Physics a-Materials Science & Processing

Volume

77

Issue/Number

2

Publication Date

1-1-2003

Document Type

Article

Language

English

First Page

217

Last Page

221

WOS Identifier

WOS:000183444500007

ISSN

0947-8396

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