Analog micro-optics fabrication by use of a two-dimensional binary phase-grating mask
Abbreviated Journal Title
The utilization of phase-mask technology for the fabrication of an analog micro-optics profile with a thick photoresist was investigated. A two-dimensional phase-grating mask with pi phase depth can produce a desired analog variation of exposure intensity, which allows one to vary the thickness of an analog photoresist after its exposure by a photolithographic stepper and development of the photoresist. A two-dimensional phase-grating mask of square pixels was simulated, designed, and fabricated. The fabrication of analog micro-optics in a thick SPR-220 photoresist by use of this phase mask was also demonstrated. (C) 2005 Optical Society of America.
"Analog micro-optics fabrication by use of a two-dimensional binary phase-grating mask" (2005). Faculty Bibliography 2000s. 5708.