Title

Analog micro-optics fabrication by use of a two-dimensional binary phase-grating mask

Authors

Authors

J. W. Sung; H. Hockel;E. G. Johnson

Comments

Authors: contact us about adding a copy of your work at STARS@ucf.edu

Abbreviated Journal Title

Opt. Lett.

Keywords

Optics

Abstract

The utilization of phase-mask technology for the fabrication of an analog micro-optics profile with a thick photoresist was investigated. A two-dimensional phase-grating mask with pi phase depth can produce a desired analog variation of exposure intensity, which allows one to vary the thickness of an analog photoresist after its exposure by a photolithographic stepper and development of the photoresist. A two-dimensional phase-grating mask of square pixels was simulated, designed, and fabricated. The fabrication of analog micro-optics in a thick SPR-220 photoresist by use of this phase mask was also demonstrated. (C) 2005 Optical Society of America.

Journal Title

Optics Letters

Volume

30

Issue/Number

2

Publication Date

1-1-2005

Document Type

Article

DOI Link

http://dx.doi.org/10.1364/ol.30.000150

Language

English

First Page

150

Last Page

152

WOS Identifier

WOS:000226218500012

ISSN

0146-9592

Recommended Citation

"Analog micro-optics fabrication by use of a two-dimensional binary phase-grating mask" (2005). Faculty Bibliography 2000s. 5708.
https://stars.library.ucf.edu/facultybib2000/5708