Analog micro-optics fabrication by use of a two-dimensional binary phase-grating mask

    Authors

    J. W. Sung; H. Hockel;E. G. Johnson

    Comments

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    Abbreviated Journal Title

    Opt. Lett.

    Keywords

    Optics

    Abstract

    The utilization of phase-mask technology for the fabrication of an analog micro-optics profile with a thick photoresist was investigated. A two-dimensional phase-grating mask with pi phase depth can produce a desired analog variation of exposure intensity, which allows one to vary the thickness of an analog photoresist after its exposure by a photolithographic stepper and development of the photoresist. A two-dimensional phase-grating mask of square pixels was simulated, designed, and fabricated. The fabrication of analog micro-optics in a thick SPR-220 photoresist by use of this phase mask was also demonstrated. (C) 2005 Optical Society of America.

    Journal Title

    Optics Letters

    Volume

    30

    Issue/Number

    2

    Publication Date

    1-1-2005

    Document Type

    Article

    Language

    English

    First Page

    150

    Last Page

    152

    WOS Identifier

    WOS:000226218500012

    ISSN

    0146-9592

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