Ion emission measurements and mirror erosion studies for extreme ultraviolet lithography
Abbreviated Journal Title
J. Vac. Sci. Technol. B
EFFICIENCY; Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Physics, Applied
Mirror erosion by high energy ion emission from extreme UV light sources is one of the main factors contributing to EUVL collector mirror reflectivity degradation. We are measuring ion energy distributions at the mirror distance from the plasma utilizing three different ion diagnostics for the case of tin-doped microscopic droplet laser plasmas. Typical ion energy distributions measured by an electrostatic spectrorneter are described. From the ion energy distributions, an estimate of mirror erosion is obtained. The effectiveness of electrostatic field mitigation is evaluated for the EUVL source requirement. (c) 2005 American Vacuum Society.
Journal of Vacuum Science & Technology B
Article; Proceedings Paper
"Ion emission measurements and mirror erosion studies for extreme ultraviolet lithography" (2005). Faculty Bibliography 2000s. 5713.