Title

Ion emission measurements and mirror erosion studies for extreme ultraviolet lithography

Authors

Authors

K. Takenoshita; C. S. Koay; S. George; S. Teerawattansook; M. Richardson;V. Bakshi

Comments

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Abbreviated Journal Title

J. Vac. Sci. Technol. B

Keywords

EFFICIENCY; Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Physics, Applied

Abstract

Mirror erosion by high energy ion emission from extreme UV light sources is one of the main factors contributing to EUVL collector mirror reflectivity degradation. We are measuring ion energy distributions at the mirror distance from the plasma utilizing three different ion diagnostics for the case of tin-doped microscopic droplet laser plasmas. Typical ion energy distributions measured by an electrostatic spectrorneter are described. From the ion energy distributions, an estimate of mirror erosion is obtained. The effectiveness of electrostatic field mitigation is evaluated for the EUVL source requirement. (c) 2005 American Vacuum Society.

Journal Title

Journal of Vacuum Science & Technology B

Volume

23

Issue/Number

6

Publication Date

1-1-2005

Document Type

Article; Proceedings Paper

Language

English

First Page

2879

Last Page

2884

WOS Identifier

WOS:000234613200117

ISSN

1071-1023

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