Abbreviated Journal Title
J. Vac. Sci. Technol. B
Keywords
EFFICIENCY; Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Physics, Applied
Abstract
Mirror erosion by high energy ion emission from extreme UV light sources is one of the main factors contributing to EUVL collector mirror reflectivity degradation. We are measuring ion energy distributions at the mirror distance from the plasma utilizing three different ion diagnostics for the case of tin-doped microscopic droplet laser plasmas. Typical ion energy distributions measured by an electrostatic spectrorneter are described. From the ion energy distributions, an estimate of mirror erosion is obtained. The effectiveness of electrostatic field mitigation is evaluated for the EUVL source requirement. (c) 2005 American Vacuum Society.
Journal Title
Journal of Vacuum Science & Technology B
Volume
23
Issue/Number
6
Publication Date
1-1-2005
Document Type
Article; Proceedings Paper
DOI Link
Language
English
First Page
2879
Last Page
2884
WOS Identifier
ISSN
1071-1023
Recommended Citation
Takenoshita, K.; Koay, C. -S.; George, S.; Teerawattansook, S.; Richardson, M.; and Bakshi, V., "Ion emission measurements and mirror erosion studies for extreme ultraviolet lithography" (2005). Faculty Bibliography 2000s. 5713.
https://stars.library.ucf.edu/facultybib2000/5713
Comments
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