Title

13.5 nm EUV generation from tin-doped droplets using a fiber laser

Authors

Authors

S. A. George; K. C. Hou; K. Takenoshita; A. Galvanauskas;M. C. Richardson

Comments

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Abbreviated Journal Title

Opt. Express

Keywords

EXTREME-ULTRAVIOLET LITHOGRAPHY; X-RAY-EMISSION; PLASMA SOURCE; DEBRIS; Optics

Abstract

A comprehensive study of the spectral and Mo-Si mirror in-band EUV emission from tin-doped droplet laser plasma targets irradiated with a single 1064 nm beam from an Yb:doped fiber laser is reported. With pre-pulse enhancement, in-band conversion efficiency of approximately 2.1% is measured for laser irradiance intensities near 8 x 10(10) W/cm(2). This is the first study to be reported that uses a high-power, high repetition rate fiber laser with the high repetition rate droplet targets where EUV generation from plasmas is measured. (c) 2007 Optical Society of America.

Journal Title

Optics Express

Volume

15

Issue/Number

25

Publication Date

1-1-2007

Document Type

Article

Language

English

First Page

16348

Last Page

16356

WOS Identifier

WOS:000251624800008

ISSN

1094-4087

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