High Output Extreme Ultraviolet Source
An EUV source that delivers a laser beam asymmetrical relative to first collection optics. The first collection optics has an opening for the laser beam that is positioned so that the laser beam is directed towards the plasma off-axis relative to the collection optics. Thus, the strongest EUV radiation is not blocked by the target production hardware.
EP 1 255 163 A3
Application Serial Number
Assignee at Issuance
Assignee at Filing
Agency: TRW Inc.
Foreign Filing Record
Orsini, Rocco, "High Output Extreme Ultraviolet Source" (2003). UCF Patents. 238.