Abstract

An EUV source that delivers a laser beam asymmetrical relative to first collection optics. The first collection optics has an opening for the laser beam that is positioned so that the laser beam is directed toward the plasma off-axis relative to the collection optics. Thus, the strongest EUV radiation is not blocked by the target production hardware.

Document Type

Patent

Patent Number

US 6,633,048 B2

Application Serial Number

09/848,692

Issue Date

10-14-2003

Current Assignee

UCFRF

Assignee at Issuance

Agency: Northrop Grumman Corporation

Allowance Date

5-20-2003

Filing Date

5-3-2001

Assignee at Filing

Agency: Northrop Grumman Corporation

Filing Type

Nonprovisional Application Record

Donated

yes

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