Title

Ion-Ion Recombination In Mixtures Of Methane And SulfurHexafluoride

Comments

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Abbreviated Journal Title

J. Phys. D-Appl. Phys.

Keywords

Physics; Applied

Abstract

The authors have measured the recombination rate for positive and negative ions in sulphur hexafluoride and in mixtures of methane and sulphur hexafluoride in an electron beam sustained discharge. Measurements were made as a function of gas composition, gas pressure in the range 100 to 600 Torr, and reduced electric field strength in the range 12 to 150 Td. When plotted as a function of an effective ion temperature, defined by the drift velocities of the ions in the applied electric field, the rates in each of the gas mixtures follow the same Teff-1.6 power law. From comparisons with theories appropriate to the recombination of positive ions with electrons it is suggested that the index of the power law might indicate that the recombination process follows an indirect path, with the approaching ions being initially trapped in stable orbits before final stabilisation of the collision.

Journal Title

Journal of Physics D-Applied Physics

Volume

20

Issue/Number

5

Publication Date

1-1-1987

Document Type

Article

Language

English

First Page

616

Last Page

621

WOS Identifier

WOS:A1987H347700008

ISSN

0022-3727

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