Title

Source Characterization For X-Ray Proximity Lithography

Authors

Authors

K. Gabel; M. Richardson; M. Kado;A. Vassiliev

Comments

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Abbreviated Journal Title

Opt. Lett.

Keywords

LASER; PLASMAS; Optics

Abstract

Calibrated x-ray spectra from laser-produced plasmas of materials with atomic numbers varying between 12 (Mg) and 83 (Bi) were recorded to optimize the conversion efficiency for proximity lithography in a 0.5-nm band centered at 1 nm. The highest efficiency (similar to 0.8%) was found for L-shell emitters such as Cu and M-shell emitters such as Ba. First-order debris measurements were carried out by measurement of the layer thickness deposited on witness plates 2 cm away from the target. Layers of 30-nm thickness were deposited in a single laser shot with Au and W targets.

Journal Title

Optics Letters

Volume

19

Issue/Number

24

Publication Date

1-1-1994

Document Type

Article

Language

English

First Page

2047

Last Page

2049

WOS Identifier

WOS:A1994QA17500001

ISSN

0146-9592

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