Source Characterization For X-Ray Proximity Lithography

    Authors

    K. Gabel; M. Richardson; M. Kado;A. Vassiliev

    Comments

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    Abbreviated Journal Title

    Opt. Lett.

    Keywords

    LASER; PLASMAS; Optics

    Abstract

    Calibrated x-ray spectra from laser-produced plasmas of materials with atomic numbers varying between 12 (Mg) and 83 (Bi) were recorded to optimize the conversion efficiency for proximity lithography in a 0.5-nm band centered at 1 nm. The highest efficiency (similar to 0.8%) was found for L-shell emitters such as Cu and M-shell emitters such as Ba. First-order debris measurements were carried out by measurement of the layer thickness deposited on witness plates 2 cm away from the target. Layers of 30-nm thickness were deposited in a single laser shot with Au and W targets.

    Journal Title

    Optics Letters

    Volume

    19

    Issue/Number

    24

    Publication Date

    1-1-1994

    Document Type

    Article

    Language

    English

    First Page

    2047

    Last Page

    2049

    WOS Identifier

    WOS:A1994QA17500001

    ISSN

    0146-9592

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