Vacuum Deposition Processes And The Properties Of Thin-Films
Abbreviated Journal Title
Plat. Surf. Finish.
ION; MICROSTRUCTURE; Metallurgy & Metallurgical Engineering; Materials Science, Coatings &; Films
The particular process used for deposition of a thin film on a substrate has a definite influence on the microstructure of that film. For vacuum deposition processes (evaporation, sputtering, ion-assisted deposition, ion-beam sputtering, ion plating), the average energy of deposited particles has been found to be the single most important parameter determining the thin film microstructure. This is shown with electron micrographs of fractured thin film cross sections and simple two-dimensional computer simulations, based on a ballistic model. The simulations show basically the treelike growth structure characteristic of diffusion-limited aggregations for vacuum evaporation, and maximal dense packing of molecules characteristic of the glassy films that energetic particle deposition processes yield (ion-beam sputtering, low-voltage ion plating). The formation of dense, glassy films is phenomenologically described by an extension of well-known structure zone models-an additional zone representing deposition conditions favoring the formation of glassy films.
Plating and Surface Finishing
"Vacuum Deposition Processes And The Properties Of Thin-Films" (1994). Faculty Bibliography 1990s. 1054.