Title
Velocity Characterization Of Particulate Debris From Laser-Produced Plasmas Used For Extreme-Ultraviolet Lithography
Abbreviated Journal Title
Appl. Optics
Keywords
EXTREME-ULTRAVIOLET LITHOGRAPHY; LASER-PRODUCED PLASMAS; PLASMA DEBRIS; RAY PROJECTION LITHOGRAPHY; Optics
Abstract
Debris from laser-produced plasmas created with solid Sn and Au targets has been characterized according to speed and particulate size. Conditions for the experiments were those appropriate for producing an optimum laser-produced plasma emission at 13.5 nm for use in extreme-ultraviolet lithography. Results in the form of histogram data show that the speed distribution of the debris particulates is quite varied and in general exhibits an upper limit of similar to 640 m/s. In the case of Sn a peak in the velocity distribution is observed near 300 m/s. Small particulates, of the order of 1 mu m or less, constitute the majority of the particulate emission in both materials. The implications for debris reduction based on the measurements are also discussed.
Journal Title
Applied Optics
Volume
34
Issue/Number
28
Publication Date
1-1-1995
Document Type
Article
Language
English
First Page
6513
Last Page
6521
WOS Identifier
ISSN
0003-6935
Recommended Citation
"Velocity Characterization Of Particulate Debris From Laser-Produced Plasmas Used For Extreme-Ultraviolet Lithography" (1995). Faculty Bibliography 1990s. 1288.
https://stars.library.ucf.edu/facultybib1990/1288
Comments
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