Velocity Characterization Of Particulate Debris From Laser-Produced Plasmas Used For Extreme-Ultraviolet Lithography

    Authors

    H. A. Bender; D. Oconnell;W. T. Silfvast

    Comments

    Authors: contact us about adding a copy of your work at STARS@ucf.edu

    Abbreviated Journal Title

    Appl. Optics

    Keywords

    EXTREME-ULTRAVIOLET LITHOGRAPHY; LASER-PRODUCED PLASMAS; PLASMA DEBRIS; RAY PROJECTION LITHOGRAPHY; Optics

    Abstract

    Debris from laser-produced plasmas created with solid Sn and Au targets has been characterized according to speed and particulate size. Conditions for the experiments were those appropriate for producing an optimum laser-produced plasma emission at 13.5 nm for use in extreme-ultraviolet lithography. Results in the form of histogram data show that the speed distribution of the debris particulates is quite varied and in general exhibits an upper limit of similar to 640 m/s. In the case of Sn a peak in the velocity distribution is observed near 300 m/s. Small particulates, of the order of 1 mu m or less, constitute the majority of the particulate emission in both materials. The implications for debris reduction based on the measurements are also discussed.

    Journal Title

    Applied Optics

    Volume

    34

    Issue/Number

    28

    Publication Date

    1-1-1995

    Document Type

    Article

    Language

    English

    First Page

    6513

    Last Page

    6521

    WOS Identifier

    WOS:A1995RW22700028

    ISSN

    0003-6935

    Share

    COinS