Title

Intense plasma discharge source at 13.5 nm for extreme-ultraviolet lithography

Authors

Authors

M. A. Klosner; H. A. Bender; W. T. Silfvast;J. J. Rocca

Comments

Authors: contact us about adding a copy of your work at STARS@ucf.edu

Abbreviated Journal Title

Opt. Lett.

Keywords

CAPILLARY DISCHARGE; RAY; EMISSION; Optics

Abstract

We measured an emission of 6 mJ/pulse at 13.5 nm produced by the Li2+ Lyman-cr transition excited by a fast capillary discharge, using a lithium hydride capillary. 75% of the energy emanated from a spot size of 0.6 mm. The emission is narrow band and would thus be useful in extreme-ultraviolet lithography imaging systems that use Mo:Si multilayer mirrors. The output within the bandwidth of Mo:Si mirrors was comparable with that of a laser-produced plasma (LPP), and the wallplug efficiency of 0.1% was nearly an order of magnitude better than that of a LPP. (C) 1997 Optical Society of America

Journal Title

Optics Letters

Volume

22

Issue/Number

1

Publication Date

1-1-1997

Document Type

Article

DOI Link

http://dx.doi.org/10.1364/ol.22.000034

Language

English

First Page

34

Last Page

36

WOS Identifier

WOS:A1997WC67400012

ISSN

0146-9592

Recommended Citation

"Intense plasma discharge source at 13.5 nm for extreme-ultraviolet lithography" (1997). Faculty Bibliography 1990s. 1968.
https://stars.library.ucf.edu/facultybib1990/1968