Intense plasma discharge source at 13.5 nm for extreme-ultraviolet lithography

    Authors

    M. A. Klosner; H. A. Bender; W. T. Silfvast;J. J. Rocca

    Comments

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    Abbreviated Journal Title

    Opt. Lett.

    Keywords

    CAPILLARY DISCHARGE; RAY; EMISSION; Optics

    Abstract

    We measured an emission of 6 mJ/pulse at 13.5 nm produced by the Li2+ Lyman-cr transition excited by a fast capillary discharge, using a lithium hydride capillary. 75% of the energy emanated from a spot size of 0.6 mm. The emission is narrow band and would thus be useful in extreme-ultraviolet lithography imaging systems that use Mo:Si multilayer mirrors. The output within the bandwidth of Mo:Si mirrors was comparable with that of a laser-produced plasma (LPP), and the wallplug efficiency of 0.1% was nearly an order of magnitude better than that of a LPP. (C) 1997 Optical Society of America

    Journal Title

    Optics Letters

    Volume

    22

    Issue/Number

    1

    Publication Date

    1-1-1997

    Document Type

    Article

    Language

    English

    First Page

    34

    Last Page

    36

    WOS Identifier

    WOS:A1997WC67400012

    ISSN

    0146-9592

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