Characterization of cathodically deposited carbonaceous films on a silicon substrate

    Authors

    S. E. Kwiatek; V. Desai; P. J. Moran;P. M. Natishan

    Comments

    Authors: contact us about adding a copy of your work at STARS@ucf.edu

    Abbreviated Journal Title

    J. Mater. Sci.

    Keywords

    DIAMOND; SPECTROSCOPY; Materials Science, Multidisciplinary

    Abstract

    Carbon-based deposits were electrochemically formed on silicon substrates in ethanol at room temperature. This work was based on the work reported by Namba, who described the electrochemical deposition of diamond from organic solutions. The deposits were analysed using a scanning electron microscope, energy dispersive spectroscopy (EDS), X-ray photoelectron spectroscopy (XPS), Raman spectroscopy and electrochemical impedance spectroscopy. Scanning electron micrographs showed some crystalline deposits on the silicon. EDS was unable to identify carbon in the film, but did reveal impurities such as sodium, potassium, calcium and zinc. It was later established that the impurities most likely came from impurities in the graphite used for a counter electrode. XPS showed the presence of carbon species, and subsequently Raman spectroscopy was used to classify further the carbon deposits. Raman spectroscopy showed the presence of amorphous carbon in some films, but no diamond peak was observed for any of the films. EIS revealed that the impedance of the deposited films was nearly identical to that of the uncoated silicon, and did not resemble the impedance of diamond. Thus, in this work, carbon-based films were formed electrochemically, but these films were not diamond.

    Journal Title

    Journal of Materials Science

    Volume

    32

    Issue/Number

    12

    Publication Date

    1-1-1997

    Document Type

    Article

    Language

    English

    First Page

    3123

    Last Page

    3128

    WOS Identifier

    WOS:A1997XG48000005

    ISSN

    0022-2461

    Share

    COinS