Abbreviated Journal Title
J. Appl. Phys.
Keywords
High-Level Injection; Physics; Applied
Abstract
The capacitance associated with free-carrier charge storage in the quasineutral region is a primary factor in limiting the switching speed of pin junction devices. This capacitance has been conventionally modeled using assumptions such as low-level injection, nondegeneracy, complete impurity ionization, and no space-charge region thickness modulation. These assumptions can give rise to a large error in device modeling, particularly for modern devices with very small geometry and high bias conditions. In this article, a comprehensive quasineutral region capacitance model including relevant device physics is developed. Comparisons between the present and conventional models are made, and the effects of using these two different models on the total capacitance of junction diode are also investigated.
Journal Title
Journal of Applied Physics
Volume
81
Issue/Number
12
Publication Date
1-1-1997
Document Type
Article
DOI Link
Language
English
First Page
8074
Last Page
8078
WOS Identifier
ISSN
0021-8979
Recommended Citation
Liou, J. J.; Xue, J.; Cao, X.; and Zhou, W., "Model for the quasineutral region capacitance of p/n junction devices" (1997). Faculty Bibliography 1990s. 1990.
https://stars.library.ucf.edu/facultybib1990/1990
Comments
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