Characterization and optimization of zinc oxide films by rf magnetron sputtering

    Authors

    K. B. Sundaram;A. Khan

    Comments

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    Abbreviated Journal Title

    Thin Solid Films

    Keywords

    deposition processes; sputtering; zinc oxide; ZNO FILMS; ELECTRICAL-PROPERTIES; GAS SENSORS; DEPOSITION; SYSTEM; ATOMS; Materials Science, Multidisciplinary; Materials Science, Coatings &; Films; Physics, Applied; Physics, Condensed Matter

    Abstract

    Zinc oxide films were deposited by a r.f. magnetron sputtering using a zinc oxide target. The deposited films were characterized as a function of deposition temperature, pressure, argon-oxygen gas flow ratio, target-substrate distance. The deposition conditions were optimized to give good quality films suitable for the fabrication of surface acoustic wave device. The films deposited at temperatures as low as 250 degrees C yielded surface acoustic wave device quality. (C) 1997 Elsevier Science S.A.

    Journal Title

    Thin Solid Films

    Volume

    295

    Issue/Number

    1-2

    Publication Date

    1-1-1997

    Document Type

    Article

    Language

    English

    First Page

    87

    Last Page

    91

    WOS Identifier

    WOS:A1997WY19200017

    ISSN

    0040-6090

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