Title
Characterization and optimization of zinc oxide films by rf magnetron sputtering
Abbreviated Journal Title
Thin Solid Films
Keywords
deposition processes; sputtering; zinc oxide; ZNO FILMS; ELECTRICAL-PROPERTIES; GAS SENSORS; DEPOSITION; SYSTEM; ATOMS; Materials Science, Multidisciplinary; Materials Science, Coatings &; Films; Physics, Applied; Physics, Condensed Matter
Abstract
Zinc oxide films were deposited by a r.f. magnetron sputtering using a zinc oxide target. The deposited films were characterized as a function of deposition temperature, pressure, argon-oxygen gas flow ratio, target-substrate distance. The deposition conditions were optimized to give good quality films suitable for the fabrication of surface acoustic wave device. The films deposited at temperatures as low as 250 degrees C yielded surface acoustic wave device quality. (C) 1997 Elsevier Science S.A.
Journal Title
Thin Solid Films
Volume
295
Issue/Number
1-2
Publication Date
1-1-1997
Document Type
Article
Language
English
First Page
87
Last Page
91
WOS Identifier
ISSN
0040-6090
Recommended Citation
"Characterization and optimization of zinc oxide films by rf magnetron sputtering" (1997). Faculty Bibliography 1990s. 2109.
https://stars.library.ucf.edu/facultybib1990/2109
Comments
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