Title

Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region

Authors

Authors

M. A. Klosner;W. T. Silfvast

Comments

Authors: contact us about adding a copy of your work at STARS@ucf.edu

Abbreviated Journal Title

Opt. Lett.

Keywords

LITHOGRAPHY; Optics

Abstract

We have observed intense extreme-ultraviolet emission, within the 10-16-nm-wavelength range, emitted by a xenon capillary discharge plasma. Within a 0.3-nm bandwidth centered at 13.5 nm the axial emission intensity was comparable with that from the brightest laser-produced plasma sources, and a similar intensity was measured at approximately 11.3 nm. This source could thus be suitable for extreme-ultraviolet imaging applications, such as extreme-ultraviolet lithography. (C) 1998 Optical Society of America.

Journal Title

Optics Letters

Volume

23

Issue/Number

20

Publication Date

1-1-1998

Document Type

Article

DOI Link

http://dx.doi.org/10.1364/ol.23.001609

Language

English

First Page

1609

Last Page

1611

WOS Identifier

WOS:000076582800015

ISSN

0146-9592

Recommended Citation

"Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region" (1998). Faculty Bibliography 1990s. 2310.
https://stars.library.ucf.edu/facultybib1990/2310