Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region

    Authors

    M. A. Klosner;W. T. Silfvast

    Comments

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    Abbreviated Journal Title

    Opt. Lett.

    Keywords

    LITHOGRAPHY; Optics

    Abstract

    We have observed intense extreme-ultraviolet emission, within the 10-16-nm-wavelength range, emitted by a xenon capillary discharge plasma. Within a 0.3-nm bandwidth centered at 13.5 nm the axial emission intensity was comparable with that from the brightest laser-produced plasma sources, and a similar intensity was measured at approximately 11.3 nm. This source could thus be suitable for extreme-ultraviolet imaging applications, such as extreme-ultraviolet lithography. (C) 1998 Optical Society of America.

    Journal Title

    Optics Letters

    Volume

    23

    Issue/Number

    20

    Publication Date

    1-1-1998

    Document Type

    Article

    Language

    English

    First Page

    1609

    Last Page

    1611

    WOS Identifier

    WOS:000076582800015

    ISSN

    0146-9592

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