Deposition Of Dense And Hard Coatings By Ion-Assisted And Plasma-Assisted Vacuum Processes

    Authors

    K. H. Guenther

    Comments

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    Abbreviated Journal Title

    Plat. Surf. Finish.

    Abstract

    Vacuum-deposited thin films have suffered because some of their properties are inferior to those of the respective bulk material. The growth process of these films is the fundamental reason for weaker properties, which include density and hardness. It causes a less-than-dense, columnar or dendritic microstructure, that is apt to change electrical, mechanical, and optical properties upon adsorption and desorption of environmental contaminants - predominantly water molecules from humid air. Through ion-assisted deposition (IAD), researchers have attempted to grow thin films with "bulk-like" microstructure and properties, many times utilizing the co-irradiation of the growing film with energetic ion beams. At the University of Central Florida, a major alternative R&D effort is in progress to study and apply reactive low voltage ion plating (RLVIP) techniques for thin film growth, employing a state-of-the-art, high-vacuum deposition system with extensive process diagnostics and thin film characterization.

    Journal Title

    Plating and Surface Finishing

    Volume

    78

    Issue/Number

    6

    Publication Date

    1-1-1991

    Document Type

    Article

    Language

    English

    First Page

    30

    Last Page

    &

    WOS Identifier

    WOS:A1991FQ03900010

    ISSN

    0360-3164

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