Mass-limited, debris-free laser-plasma EUV source

    Authors

    M. Richardson; D. Torres; C. DePriest; F. Jin;G. Shimkaveg

    Comments

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    Abbreviated Journal Title

    Opt. Commun.

    Keywords

    RAY PROJECTION LITHOGRAPHY; TARGET; Optics

    Abstract

    The development of a laser-plasma EUV line emission source based on frozen water droplet targets which is essentially debris-free and capable of continuous, high-repetition-rate ( > 1 kHz) operation is described. Created by modest ( < 1 J) laser energies, this plasma produces copious emission at 13 and 11.6 nm, the preferred wavelengths for EUV projection lithography, with negligible target operation costs. (C) 1998 Elsevier Science B.V.

    Journal Title

    Optics Communications

    Volume

    145

    Issue/Number

    1-6

    Publication Date

    1-1-1998

    Document Type

    Article

    Language

    English

    First Page

    109

    Last Page

    112

    WOS Identifier

    WOS:000071260200023

    ISSN

    0030-4018

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