Title

Mass-limited, debris-free laser-plasma EUV source

Authors

Authors

M. Richardson; D. Torres; C. DePriest; F. Jin;G. Shimkaveg

Comments

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Abbreviated Journal Title

Opt. Commun.

Keywords

RAY PROJECTION LITHOGRAPHY; TARGET; Optics

Abstract

The development of a laser-plasma EUV line emission source based on frozen water droplet targets which is essentially debris-free and capable of continuous, high-repetition-rate ( > 1 kHz) operation is described. Created by modest ( < 1 J) laser energies, this plasma produces copious emission at 13 and 11.6 nm, the preferred wavelengths for EUV projection lithography, with negligible target operation costs. (C) 1998 Elsevier Science B.V.

Journal Title

Optics Communications

Volume

145

Issue/Number

1-6

Publication Date

1-1-1998

Document Type

Article

Language

English

First Page

109

Last Page

112

WOS Identifier

WOS:000071260200023

ISSN

0030-4018

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