Title
Mass-limited, debris-free laser-plasma EUV source
Abbreviated Journal Title
Opt. Commun.
Keywords
RAY PROJECTION LITHOGRAPHY; TARGET; Optics
Abstract
The development of a laser-plasma EUV line emission source based on frozen water droplet targets which is essentially debris-free and capable of continuous, high-repetition-rate ( > 1 kHz) operation is described. Created by modest ( < 1 J) laser energies, this plasma produces copious emission at 13 and 11.6 nm, the preferred wavelengths for EUV projection lithography, with negligible target operation costs. (C) 1998 Elsevier Science B.V.
Journal Title
Optics Communications
Volume
145
Issue/Number
1-6
Publication Date
1-1-1998
Document Type
Article
Language
English
First Page
109
Last Page
112
WOS Identifier
ISSN
0030-4018
Recommended Citation
"Mass-limited, debris-free laser-plasma EUV source" (1998). Faculty Bibliography 1990s. 2417.
https://stars.library.ucf.edu/facultybib1990/2417
Comments
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