Comparative-Study Of Titanium-Dioxide Thin-Films Produced By Electron-Beam Evaporation And By Reactive Low-Voltage Ion Plating

    Authors

    K. Balasubramanian; X. F. Han;K. H. Guenther

    Comments

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    Abbreviated Journal Title

    Appl. Optics

    Keywords

    Tio2 Thin Films; Optical Constants; Electron-Beam Evaporation; Ion; Plating; Thin Films; Optics

    Abstract

    Titanium dioxide (TiO2) is often used as a high refractive-index material for multilayer optical coatings. However, the optical properties of TiO2 films depend strongly on the deposition process and its parameters. A comparative study of TiO2 films fabricated by conventional electron-beam evaporation and by reactive low-voltage ion plating that uses different phases of Ti-O as starting materials is reported. Results on the variability of TiO2 thin films are analyzed in relation to process parameters. The potential of fabricating high and low refractive-index multilayer stacks with TiO2 only, by employing two different deposition processes, is presented with a practical example.

    Journal Title

    Applied Optics

    Volume

    32

    Issue/Number

    28

    Publication Date

    1-1-1993

    Document Type

    Article

    Language

    English

    First Page

    5594

    Last Page

    5600

    WOS Identifier

    WOS:A1993LZ49700025

    ISSN

    0003-6935

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