Laser Chemical Vapor Deposition Of Thin Films

    Authors

    A. Kar;J. Mazumder

    Comments

    Authors: contact us about adding a copy of your work at STARS@ucf.edu

    Abbreviated Journal Title

    Mater. Sci. Eng. B-Solid State Mater. Adv. Technol.

    Keywords

    Laser Chemical Vapor Deposition; Thin Films; Damkohler Number; Finite Slabs; Cvd; Tin; Materials Science, Multidisciplinary; Physics, Condensed Matter

    Abstract

    Laser chemical vapor deposition (LCVD) is a technique to deposit thin film of oxidation, corrosion, and wear resistant materials as well as electronic, optoelectronic, and superconductor materials. The shape and morphology, which affect the properties of such films, depend on the laser parameters and the processing conditions. This paper presents a mathematical model to predict the shape of the deposits. Also, this model allows to select the appropriate process parameters to obtain a good quality film. The Damkohler number is shown to influence the morphology of the film. Also, an optimum condition is found to exist for depositing thin film by using the LCVD technique. Copyright (C) 1996 Elsevier Science S.A.

    Journal Title

    Materials Science and Engineering B-Solid State Materials for Advanced Technology

    Volume

    41

    Issue/Number

    3

    Publication Date

    1-1-1996

    Document Type

    Article

    Language

    English

    First Page

    368

    Last Page

    373

    WOS Identifier

    WOS:A1996WA87500013

    ISSN

    0921-5107

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