Introduction To Special Issue Of Applied Optics On Soft-X-Ray Projection Lithography

Authors

    Authors

    W. T. Silfvast;N. M. Ceglio

    Comments

    Authors: contact us about adding a copy of your work at STARS@ucf.edu

    Abbreviated Journal Title

    Appl. Optics

    Keywords

    Optics

    Abstract

    This special issue contains a collection of papers describing results that were presented at the Second Topical Meeting on Soft-X-Ray Projection Lithography sponsored by the Optical Society of America and held 6-8 April 1992 in Monterey, California, along with several additional papers submitted after that meeting. These papers are being published in this collection to make them readily available to a larger audience than would normally occur with a proceedings and also to take advantage of the critical review process.

    Journal Title

    Applied Optics

    Volume

    32

    Issue/Number

    34

    Publication Date

    1-1-1993

    Document Type

    Article

    Language

    English

    First Page

    6895

    Last Page

    6896

    WOS Identifier

    WOS:A1993MM44500001

    ISSN

    0003-6935

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