Absorption and Thermal-conductivity of Oxide Thin-Films Measured by Photothermal Displacement and Reflectance Methods

    Authors

    Z. L. Wu; M. Reichling; X. Q. Hu; K. Balasubramanian;K. H. Guenther

    Comments

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    Keywords

    Surface Deformation Technique; Spectroscopy; Deflection; Optics

    Abstract

    Photothermal reflectance and photothermal displacement measurements of optical absorption and thermal conductivity are reported for electron-beam- (EB) deposited and ion-plated (IP) thin films of TiO2, Ta2O5, and ZrO2. Of the particular set of samples investigated, the EB films have higher absorption than the IP films. The absorption of the EB samples decreases over a period of approximately 90 min on irradiations with an Ar-ion laser of 488-nm wavelength. By contrast, the absorption of the IP samples changes insignificantly or not at all. Photothermal displacement area scans of coating surfaces yield lower defect densities for the IP samples compared with the EB samples for al three oxide materials. The feasibility and limitations of photothermal measurements for thin-film optical and thermal characterizations are discussed.

    Journal Title

    Applied Optics

    Volume

    32

    Issue/Number

    28

    Publication Date

    1-1-1993

    Document Type

    Article

    Language

    English

    First Page

    5660

    Last Page

    5665

    WOS Identifier

    WOS:A1993LZ49700034

    ISSN

    0003-6935

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