Title

Emission-Spectroscopy Of Reactive Low-Voltage Ion Plating For Metal-Oxide Thin-Films

Authors

Authors

S. Zarrabian; C. Lee;K. H. Guenther

Comments

Authors: contact us about adding a copy of your work at STARS@ucf.edu

Abbreviated Journal Title

Appl. Optics

Keywords

PLASMA DIAGNOSTICS; ATOMIC OXYGEN; PRESSURE; EVAPORATION; TEMPERATURE; DISCHARGES; GROWTH; Optics

Abstract

Excited species in the plasma present during reactive low-voltage ion plating (RLVIP) of refractory oxide films are studied by using emission spectroscopy. We believe we have found a higher ratio of atomic to molecular oxygen then reported for earlier analyses that employed a quadrupole mass spectrometer. The application of emission spectroscopy to the RLVIP process and self-actinometry are discussed with examples of stable and unstable processes.

Journal Title

Applied Optics

Volume

32

Issue/Number

28

Publication Date

1-1-1993

Document Type

Article

Language

English

First Page

5606

Last Page

5611

WOS Identifier

WOS:A1993LZ49700027

ISSN

0003-6935

Recommended Citation

"Emission-Spectroscopy Of Reactive Low-Voltage Ion Plating For Metal-Oxide Thin-Films" (1993). Faculty Bibliography 1990s. 967.
https://stars.library.ucf.edu/facultybib1990/967