Emission-Spectroscopy Of Reactive Low-Voltage Ion Plating For Metal-Oxide Thin-Films

    Authors

    S. Zarrabian; C. Lee;K. H. Guenther

    Comments

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    Abbreviated Journal Title

    Appl. Optics

    Keywords

    PLASMA DIAGNOSTICS; ATOMIC OXYGEN; PRESSURE; EVAPORATION; TEMPERATURE; DISCHARGES; GROWTH; Optics

    Abstract

    Excited species in the plasma present during reactive low-voltage ion plating (RLVIP) of refractory oxide films are studied by using emission spectroscopy. We believe we have found a higher ratio of atomic to molecular oxygen then reported for earlier analyses that employed a quadrupole mass spectrometer. The application of emission spectroscopy to the RLVIP process and self-actinometry are discussed with examples of stable and unstable processes.

    Journal Title

    Applied Optics

    Volume

    32

    Issue/Number

    28

    Publication Date

    1-1-1993

    Document Type

    Article

    Language

    English

    First Page

    5606

    Last Page

    5611

    WOS Identifier

    WOS:A1993LZ49700027

    ISSN

    0003-6935

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