H-Atom Position as Pattern-Determining Factor in Arenethiol Films

    Authors

    K. Y. Kwon; G. Pawin; K. L. Wong; E. Peters; D. Kim; S. Hong; T. S. Rahman; M. Marsella;L. Bartels

    Abbreviated Journal Title

    J. Am. Chem. Soc.

    Keywords

    SCANNING-TUNNELING-MICROSCOPY; SELF-ASSEMBLED MONOLAYERS; CENTER-DOT-F; HYDROGEN-BONDS; SUPRAMOLECULAR NANOSTRUCTURES; MOLECULAR-DYNAMICS; AU(111) SURFACE; METAL-SURFACE; CU(111); ENERGY; Chemistry, Multidisciplinary

    Abstract

    The evolution of a low coverage of benzenethiol molecules on Cu(111) during annealing shows the prevalence of S center dot center dot center dot H hydrogen bonds involving hydrogen atoms in the ortho position. The row and pattern formation of (methylated) anthracenethiols indicates intermolecular interactions in which hydrogen atoms at the terminal position of the aromatic moiety dominate. In combination, this leads to the notion that pattern formation in classes of arenethiol molecules is each governed by optimization of the intermolecular interactions of the hydrogen atom at one particular position on the arene. This may provide a general guiding principle for the design of arenethiol films.

    Journal Title

    Journal of the American Chemical Society

    Volume

    131

    Issue/Number

    15

    Publication Date

    1-1-2009

    Document Type

    Article

    Language

    English

    First Page

    5540

    Last Page

    5545

    WOS Identifier

    WOS:000265268100037

    ISSN

    0002-7863

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