Dynamics of mass-limited laser plasma targets as sources for extreme ultraviolet lithography

    Authors

    C. Keyser; R. Bernath; M. Al-Rabban;M. Richardson

    Comments

    Authors: contact us about adding a copy of your work at STARS@ucf.edu

    Abbreviated Journal Title

    Jpn. J. Appl. Phys. Part 1 - Regul. Pap. Short Notes Rev. Pap.

    Keywords

    laser plasma; EUV lithography; water droplet target; X-RAY-LITHOGRAPHY; EUV; Physics, Applied

    Abstract

    The droplet laser plasma source has many attractive features as a continuous, almost debris-free source for extreme ultraviolet (EUV) and X-ray radiation applications. In a combined experimental and theoretical study, we are analyzing the interaction physics between the laser light and microscopic spherical liquid droplet targets over a range of conditions.

    Journal Title

    Japanese Journal of Applied Physics Part 1-Regular Papers Short Notes & Review Papers

    Volume

    41

    Issue/Number

    6B

    Publication Date

    1-1-2002

    Document Type

    Article; Proceedings Paper

    Language

    English

    First Page

    4070

    Last Page

    4073

    WOS Identifier

    WOS:000177169700010

    ISSN

    0021-4922

    Share

    COinS