Title

Dynamics of mass-limited laser plasma targets as sources for extreme ultraviolet lithography

Authors

Authors

C. Keyser; R. Bernath; M. Al-Rabban;M. Richardson

Comments

Authors: contact us about adding a copy of your work at STARS@ucf.edu

Abbreviated Journal Title

Jpn. J. Appl. Phys. Part 1 - Regul. Pap. Short Notes Rev. Pap.

Keywords

laser plasma; EUV lithography; water droplet target; X-RAY-LITHOGRAPHY; EUV; Physics, Applied

Abstract

The droplet laser plasma source has many attractive features as a continuous, almost debris-free source for extreme ultraviolet (EUV) and X-ray radiation applications. In a combined experimental and theoretical study, we are analyzing the interaction physics between the laser light and microscopic spherical liquid droplet targets over a range of conditions.

Journal Title

Japanese Journal of Applied Physics Part 1-Regular Papers Short Notes & Review Papers

Volume

41

Issue/Number

6B

Publication Date

1-1-2002

Document Type

Article; Proceedings Paper

DOI Link

http://dx.doi.org/10.1143/jjap.41.4070

Language

English

First Page

4070

Last Page

4073

WOS Identifier

WOS:000177169700010

ISSN

0021-4922

Recommended Citation

"Dynamics of mass-limited laser plasma targets as sources for extreme ultraviolet lithography" (2002). Faculty Bibliography 2000s. 3285.
https://stars.library.ucf.edu/facultybib2000/3285