Aberration measurement of photolithographic lenses by use of hybrid diffractive photomasks

    Authors

    J. W. Sung; M. Pitchumani;E. G. Johnson

    Abbreviated Journal Title

    Appl. Optics

    Keywords

    Optics

    Abstract

    In optical lithography the degradation of imagequality due to aberrations present in the exposure tool is a serious problem. Therefore it is desirable to establish a reliable aberration measurement procedure based on the analysis of printed images in the photoresist. We present what is to our knowledge a new method for characterizing the aberrations of an exposure tool using a hybrid diffractive photomask. By utilizing each different impact on the aberrated image from each diffracted illumination, we were able to extract the aberration present in the stepper system. We experimentally verified this method with a G-line stepper and verified its spherical aberration astigmatism. (C) 2003 Optical Society of America.

    Journal Title

    Applied Optics

    Volume

    42

    Issue/Number

    11

    Publication Date

    1-1-2003

    Document Type

    Article

    Language

    English

    First Page

    1987

    Last Page

    1995

    WOS Identifier

    WOS:000182120200008

    ISSN

    1559-128X

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