Micro-optic fabrication with subdomain masking

    Authors

    M. Pitchumani; J. Brown; W. Mohammed;E. G. Johnson

    Comments

    Authors: contact us about adding a copy of your work at STARS@ucf.edu

    Abbreviated Journal Title

    Appl. Optics

    Keywords

    ADDITIVE LITHOGRAPHY; Optics

    Abstract

    An innovative fabrication technique is introduced that is based on multiple-exposure techniques for micro-optics fabrication. This approach is compatible with conventional lithography systems used in integrated circuit manufacturing and can be applied to thick and thin photoresists and is based on additive lithographic techniques introduced elsewhere [Appl. Opt. 41, 6176 (2002)]. We chose a simple subdomain basis set to transform the two-dimensional basis patterns into a family of various three-dimensional micro-optic elements using exposure control to modulate the third dimension. We demonstrate the capability to sculpt the photoresist into a variety of three-dimensional micro-optic elements by performing multiple exposures using elements from the subdomain basis set, without resorting to multiple etching steps. (C) 2004 Optical Society of America.

    Journal Title

    Applied Optics

    Volume

    43

    Issue/Number

    8

    Publication Date

    1-1-2004

    Document Type

    Article

    Language

    English

    First Page

    1676

    Last Page

    1682

    WOS Identifier

    WOS:000220064900011

    ISSN

    1559-128X

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