Diffusion-limited growth of FTO-nanofilm-coated tin fractals

Authors

    Authors

    D. Bera; S. Patil; K. Scammon;S. Seal

    Comments

    Authors: contact us about adding a copy of your work at STARS@ucf.edu

    Abbreviated Journal Title

    Electrochem. Solid State Lett.

    Keywords

    POROUS ANODIC FILMS; OXIDE-FILMS; OPTICAL-PROPERTIES; MECHANISM; AGGREGATION; TITANIUM; SNO2; Electrochemistry; Materials Science, Multidisciplinary

    Abstract

    Highly porous, geometrical complex fractals of 3 nm thick fluorinated tin oxide (FTO) coated tin have been synthesized during a simple anodization. The dimensionality of fractals is 2.95. Quantitative analysis of the FTO nanofilm shows the fluorine content in the FTO film to be as high as 25 atom %. The mechanism of preferential growth of the tin fractals under the influence of the applied electric field during the anodization was explained using a diffusion-limited aggregation (DLA) model. (c) 2005 The Electrochemical Society.

    Journal Title

    Electrochemical and Solid State Letters

    Volume

    8

    Issue/Number

    10

    Publication Date

    1-1-2005

    Document Type

    Article

    Language

    English

    First Page

    D31

    Last Page

    D34

    WOS Identifier

    WOS:000231390900029

    ISSN

    1099-0062

    Share

    COinS