Title
Wavelength selection for the far-infrared p-Ge laser using etched silicon lamellar gratings
Abbreviated Journal Title
Opt. Laser Technol.
Keywords
terahertz; germanium; laser; CAVITY; Optics; Physics, Applied
Abstract
A lamellar mirror made from Si wafer by anisotropic chemical etching and coated with gold has been demonstrated as an intracavity wavelength selector for the far-infrared p-Ge laser. The etching process produces rectangular grooves with precisely predetermined depth and 100 nm surface smoothness. This lamellar-grating structure defines the resonant laser wavelength within the broad tuning range of the p-Ge laser. Single wavelength laser operation with this mirror has been demonstrated on the third-order resonance with ail active cavity finesse of at least 0.09. (C) 2004 Elsevier Ltd. All rights reserved.
Journal Title
Optics and Laser Technology
Volume
37
Issue/Number
2
Publication Date
1-1-2005
Document Type
Article
Language
English
First Page
87
Last Page
91
WOS Identifier
ISSN
0030-3992
Recommended Citation
"Wavelength selection for the far-infrared p-Ge laser using etched silicon lamellar gratings" (2005). Faculty Bibliography 2000s. 5151.
https://stars.library.ucf.edu/facultybib2000/5151
Comments
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