Effect of thermal treatment in oxygen, nitrogen, and air atmospheres on the electrical transport properties of zinc oxide thin films

    Authors

    O. Hamad; G. Braunstein; H. Patil;N. Dhere

    Comments

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    Abbreviated Journal Title

    Thin Solid Films

    Keywords

    zinc oxide; heat treatment; electrical properties and measurements; sputtering; RUTHERFORD BACKSCATTERING; ION-IMPLANTATION; P-TYPE; ZNO; CONDUCTIVITY; CRYSTALS; HYDROGEN; DEFECTS; ATOMS; Materials Science, Multidisciplinary; Materials Science, Coatings &; Films; Physics, Applied; Physics, Condensed Matter

    Abstract

    The effects of thermal treatment in oxygen, air, and nitrogen gas atmospheres, at temperatures ranging from 573 to 1173 K, on the electrical transport properties of thin films of zinc oxide, prepared by sputtering deposition, have been investigated. These experiments have been carried out in preparation for future ion implantation doping studies in zinc oxide. As-prepared samples were slightly oxygen-deficient (Zn: 51%, O: 49%), due to a relatively low concentration of oxygen in the sputtering gas, and exhibited n-type conductivity (sheet resistance similar to 3 x 10(2) Omega/square, sheet carrier concentration similar to 8 x 10(14) cm(-2), carrier concentration 4 x 10(19) cm(-3), and mobility similar to 30 cm(2)/V s). Heat treatment in oxygen atmosphere led to a decrease in carrier concentration with increasing temperature. Upon annealing at 1173 K the carrier concentration was similar to 1 x 10(17) cm(-3) and the mobility was similar to 7 cm(2)/V s, while heat treatment in nitrogen atmosphere, at the same temperature, resulted in almost no change in carrier concentration but with significant decrease in mobility to similar to 1 cm(2)/V s. Heat treatment in air led to values of carrier concentration and mobility, intermediate between those observed upon annealing in oxygen or nitrogen gases. These results suggest that the electrical transport properties of zinc oxide thin films are extremely dependent upon deposition conditions and post-deposition treatments and these effects should be carefully considered in any doping attempt by ion implantation. (c) 2005 Elsevier B.V. All rights reserved.

    Journal Title

    Thin Solid Films

    Volume

    489

    Issue/Number

    1-2

    Publication Date

    1-1-2005

    Document Type

    Article

    Language

    English

    First Page

    303

    Last Page

    309

    WOS Identifier

    WOS:000231435400045

    ISSN

    0040-6090

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