Optimization of chemical bath deposited US thin films using nitrilotriacetic acid as a complexing agent

    Authors

    H. Khallaf; I. O. Oladeji;L. Chow

    Comments

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    Abbreviated Journal Title

    Thin Solid Films

    Keywords

    CdS; thin films; chemical bath deposition; nitrilotriacetic acid; CADMIUM-SULFIDE; CDS FILMS; GROWTH-KINETICS; SOLAR-CELLS; CBD; SEMICONDUCTOR; EFFICIENCY; Materials Science, Multidisciplinary; Materials Science, Coatings &; Films; Physics, Applied; Physics, Condensed Matter

    Abstract

    We report a design of experiment approach for the optimization of CdS thin films grown by chemical bath deposition using nitrilotriacetic acid (NTA) as a complexing agent. With the help of this approach, we developed a set of experiments that enabled us to maximize the growth rate. In comparison with works reported earlier, a much faster growth rate is achieved. Two different cadmium precursors; CdSO(4) and CdCl(2) were used in this work. Only NTA was used as a ligand for all films deposited on transparent conducting oxide coated soda lime glass substrates. CdS films deposited on quartz glass using only NTA peeled off, and became patchy. However, with the addition of hydrazine monohydrate, high quality CdS films were obtained on quartz glass. (c) 2007 Elsevier B.V. All rights reserved.

    Journal Title

    Thin Solid Films

    Volume

    516

    Issue/Number

    18

    Publication Date

    1-1-2008

    Document Type

    Article

    Language

    English

    First Page

    5967

    Last Page

    5973

    WOS Identifier

    WOS:000258037300007

    ISSN

    0040-6090

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