Title

Optimization of chemical bath deposited US thin films using nitrilotriacetic acid as a complexing agent

Authors

Authors

H. Khallaf; I. O. Oladeji;L. Chow

Comments

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Abbreviated Journal Title

Thin Solid Films

Keywords

CdS; thin films; chemical bath deposition; nitrilotriacetic acid; CADMIUM-SULFIDE; CDS FILMS; GROWTH-KINETICS; SOLAR-CELLS; CBD; SEMICONDUCTOR; EFFICIENCY; Materials Science, Multidisciplinary; Materials Science, Coatings &; Films; Physics, Applied; Physics, Condensed Matter

Abstract

We report a design of experiment approach for the optimization of CdS thin films grown by chemical bath deposition using nitrilotriacetic acid (NTA) as a complexing agent. With the help of this approach, we developed a set of experiments that enabled us to maximize the growth rate. In comparison with works reported earlier, a much faster growth rate is achieved. Two different cadmium precursors; CdSO(4) and CdCl(2) were used in this work. Only NTA was used as a ligand for all films deposited on transparent conducting oxide coated soda lime glass substrates. CdS films deposited on quartz glass using only NTA peeled off, and became patchy. However, with the addition of hydrazine monohydrate, high quality CdS films were obtained on quartz glass. (c) 2007 Elsevier B.V. All rights reserved.

Journal Title

Thin Solid Films

Volume

516

Issue/Number

18

Publication Date

1-1-2008

Document Type

Article

Language

English

First Page

5967

Last Page

5973

WOS Identifier

WOS:000258037300007

ISSN

0040-6090

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