Thin film deposition on plastic substrates using silicon nanoparticles and laser nanoforming

    Authors

    S. Bet;A. Kar

    Comments

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    Abbreviated Journal Title

    Mater. Sci. Eng. B-Solid State Mater. Adv. Technol.

    Keywords

    nanocrystalline silicon; laser nanoforming; polycrystalline silicon; SEM; Raman spectroscopy; CRYSTAL SI FILMS; AMORPHOUS-SILICON; GLASS; CRYSTALLIZATION; GROWTH; Materials Science, Multidisciplinary; Physics, Condensed Matter

    Abstract

    Reduced melting temperature of nanoparticles is utilized to deposit thin polycrystalline silicon (c-Si) films on plastic substrates by using a laser beam without damaging the substrate. An aqueous dispersion of 5 nm silicon nanoparticles was used as precursor. A Nd:YAG (1064 nm wavelength) laser operating in continuous wave (CW) mode was used for thin film formation. Polycrystalline Si films were deposited on flexible as well as rigid plastic substrates in both air and argon ambients. The films were analyzed by optical microscopy for film formation, scanning electron microscopy (SEM) for microstructural features, energy dispersive spectroscopy (EDS) for impurities, X-ray photoelectron spectroscopy (XPS) for composition and bond information of the recrystallized film and Raman spectroscopy for estimating shift from amorphous to more crystalline phase. Raman spectroscopy showed a shift from amorphous to more crystalline phases with increasing both the laser power and irradiation time during laser recrystallization step. (c) 2006 Elsevier B.V. All rights reserved.

    Journal Title

    Materials Science and Engineering B-Solid State Materials for Advanced Technology

    Volume

    130

    Issue/Number

    1-3

    Publication Date

    1-1-2006

    Document Type

    Article

    Language

    English

    First Page

    228

    Last Page

    236

    WOS Identifier

    WOS:000238603400037

    ISSN

    0921-5107

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