Title
Investigation of diode geometry and metal line pattern for robust ESD protection applications
Abbreviated Journal Title
Microelectron. Reliab.
Keywords
Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Physics, Applied
Abstract
The effect of different diode geometries and metal patterns on the failure current It2 is investigated experimentally. The devices considered are N+/P well LOCOS diodes having different lengths, widths, finger numbers, and metal connections. The results provide useful insights into optimizing the diode for robust electrostatic discharge (ESD) protection applications. (C) 2008 Elsevier Ltd. All rights reserved.
Journal Title
Microelectronics Reliability
Volume
48
Issue/Number
10
Publication Date
1-1-2008
Document Type
Article
Language
English
First Page
1660
Last Page
1663
WOS Identifier
ISSN
0026-2714
Recommended Citation
"Investigation of diode geometry and metal line pattern for robust ESD protection applications" (2008). Faculty Bibliography 2000s. 610.
https://stars.library.ucf.edu/facultybib2000/610
Comments
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