Abbreviated Journal Title
J. Appl. Phys.
Keywords
THIN-FILMS; STOICHIOMETRY; Physics, Applied
Abstract
The loss of Fe due to oxidation or diffusion into the substrate can prevent the successful preparation of well-ordered, stoichiometric, FePt nanoparticles. In this work we report the composition changes during annealing observed for small ( < 10 nm) FePt nanoparticles on thermally grown SiO2 layers on Si wafer substrates. Additionally, we describe the use of a controlled reducing gas mixture, Ar+H-2+H2O, to reduce the loss of Fe.
Journal Title
Journal of Applied Physics
Volume
99
Issue/Number
8
Publication Date
1-1-2006
Document Type
Article
DOI Link
Language
English
First Page
3
WOS Identifier
ISSN
0021-8979
Recommended Citation
Yao, B.; Petrova, R. V.; Vanfleet, R. R.; and Coffey, K. R., "Compositional stability of FePt nanoparticles on SiO2/Si during annealing" (2006). Faculty Bibliography 2000s. 6734.
https://stars.library.ucf.edu/facultybib2000/6734
Comments
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