Rigorous electromagnetic analysis of volumetrically complex media using the slice absorption method

    Authors

    R. C. Rumpf; A. Tal;S. M. Kuebler

    Comments

    Authors: contact us about adding a copy of your work at STARS@ucf.edu

    Abbreviated Journal Title

    J. Opt. Soc. Am. A-Opt. Image Sci. Vis.

    Keywords

    PHOTONIC BAND STRUCTURES; COUPLED-WAVE ANALYSIS; EFFICIENT; IMPLEMENTATION; HOLOGRAPHIC LITHOGRAPHY; PERIODIC STRUCTURES; MAXWELLS; EQUATIONS; NEAR-FIELD; GRATINGS; FABRICATION; CRYSTALS; Optics

    Abstract

    There is tremendous demand for numerical methods to perform rigorous analysis of devices that are both large scale and complex throughout their volume. This can arise when devices must be considered with realistic geometry or when they contain artificial materials such as photonic crystals, left-handed materials, nanoparticles, or other metamaterials. The slice absorption method (SAM) was developed to address this need. The method is fully numerical and able to break large problems down into small pieces, or slices, using matrix division or Gaussian elimination instead of eigensystern computations and scattering matrix manipulations. In these regards, the SAM is an attractive alternative to popular techniques like the finite-difference time domain method, rigorous coupled-wave analysis, and the transfer matrix method. To demonstrate the utility of the SAM and benchmark its accuracy, reflection was simulated for a photonic crystal fabricated in SU-8 by multiphoton direct laser writing. Realistic geometry was incorporated into the model by simulating the microfabrication. process, which yielded simulation results that matched experimental measurements remarkably well. (c) 2007 Optical Society of America.

    Journal Title

    Journal of the Optical Society of America a-Optics Image Science and Vision

    Volume

    24

    Issue/Number

    10

    Publication Date

    1-1-2007

    Document Type

    Article

    Language

    English

    First Page

    3123

    Last Page

    3134

    WOS Identifier

    WOS:000250682300021

    ISSN

    1084-7529

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