Wet etching of sputtered tantalum thin films in NaOH and KOH based solutions

    Authors

    S. Sood; R. Peelamedu; K. B. Sundaram; E. Dein;R. M. Todi

    Comments

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    Abbreviated Journal Title

    J. Mater. Sci.-Mater. Electron.

    Keywords

    GALVANIC CORROSION; COPPER; Engineering, Electrical & Electronic; Materials Science, ; Multidisciplinary; Physics, Applied; Physics, Condensed Matter

    Abstract

    In this paper, a wet chemical etching technique to selectively etch tantalum thin film in sodium hydroxide and potassium hydroxide based solutions was developed. Tantalum thin films were deposited by a DC-magnetron sputtering technique on silica and yttria-stabilized zirconia (YSZ) substrates. After deposition, the films were etched in hot NaOH/ H2O2 and KOH/H2O2 based solutions with Au/Cr film as a hard mask. The etch rate was studied as a function of temperature and concentration of the etchants.

    Journal Title

    Journal of Materials Science-Materials in Electronics

    Volume

    18

    Issue/Number

    5

    Publication Date

    1-1-2007

    Document Type

    Article

    Language

    English

    First Page

    535

    Last Page

    539

    WOS Identifier

    WOS:000244455500010

    ISSN

    0957-4522

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