Title

Wet etching of sputtered tantalum thin films in NaOH and KOH based solutions

Authors

Authors

S. Sood; R. Peelamedu; K. B. Sundaram; E. Dein;R. M. Todi

Comments

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Abbreviated Journal Title

J. Mater. Sci.-Mater. Electron.

Keywords

GALVANIC CORROSION; COPPER; Engineering, Electrical & Electronic; Materials Science, ; Multidisciplinary; Physics, Applied; Physics, Condensed Matter

Abstract

In this paper, a wet chemical etching technique to selectively etch tantalum thin film in sodium hydroxide and potassium hydroxide based solutions was developed. Tantalum thin films were deposited by a DC-magnetron sputtering technique on silica and yttria-stabilized zirconia (YSZ) substrates. After deposition, the films were etched in hot NaOH/ H2O2 and KOH/H2O2 based solutions with Au/Cr film as a hard mask. The etch rate was studied as a function of temperature and concentration of the etchants.

Journal Title

Journal of Materials Science-Materials in Electronics

Volume

18

Issue/Number

5

Publication Date

1-1-2007

Document Type

Article

Language

English

First Page

535

Last Page

539

WOS Identifier

WOS:000244455500010

ISSN

0957-4522

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