Wet etching of sputtered tantalum thin films in NaOH and KOH based solutions
Abbreviated Journal Title
J. Mater. Sci.-Mater. Electron.
GALVANIC CORROSION; COPPER; Engineering, Electrical & Electronic; Materials Science, ; Multidisciplinary; Physics, Applied; Physics, Condensed Matter
In this paper, a wet chemical etching technique to selectively etch tantalum thin film in sodium hydroxide and potassium hydroxide based solutions was developed. Tantalum thin films were deposited by a DC-magnetron sputtering technique on silica and yttria-stabilized zirconia (YSZ) substrates. After deposition, the films were etched in hot NaOH/ H2O2 and KOH/H2O2 based solutions with Au/Cr film as a hard mask. The etch rate was studied as a function of temperature and concentration of the etchants.
Journal of Materials Science-Materials in Electronics
"Wet etching of sputtered tantalum thin films in NaOH and KOH based solutions" (2007). Faculty Bibliography 2000s. 7679.