Abbreviated Journal Title
J. Appl. Phys.
Keywords
SILICON-GERMANIUM ALLOYS; CONDUCTIVITY; SUPERLATTICES; TEMPERATURES; SI/SIGE; MODEL; Physics, Applied
Abstract
We explore the ability of molecular-dynamics simulation to elucidate thermal transport in Si-Ge alloys. Simulations using Stillinger-Weber potentials yield values for the thermal resistivity significantly higher than experimental measurements. In agreement with experiment and theoretical predictions, we find that scattering from mass disorder is dominant, with bond disorder and strain effects playing a very minor role. To explore the origins of the large discrepancies with experiment, we use theoretical methods suitable for the limit where point-defect scattering dominates the resistivity. We find that point-defect scattering models based on a Debye spectrum cannot be used to fit our simulations, indicating that high-frequency modes may play an important role in the simulation. The results have important implications for using classical molecular-dynamics simulation to predict properties of alloy materials near and below the Debye temperature.
Journal Title
Journal of Applied Physics
Volume
103
Issue/Number
11
Publication Date
1-1-2008
Document Type
Article
DOI Link
Language
English
First Page
6
WOS Identifier
ISSN
0021-8979
Recommended Citation
Skye, Ashton and Schelling, Patrick K., "Thermal resistivity of Si-Ge alloys by molecular-dynamics simulation" (2008). Faculty Bibliography 2000s. 997.
https://stars.library.ucf.edu/facultybib2000/997
Comments
Authors: contact us about adding a copy of your work at STARS@ucf.edu