Surface Modification of Carbon Post Arrays by Atomic Layer Deposition of ZnO Film

    Authors

    H. A. Lee; Y. C. Byun; U. Singh; H. J. Cho;H. Kim

    Comments

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    Abbreviated Journal Title

    J. Nanosci. Nanotechnol.

    Keywords

    Carbon Microelectromechanical System; Atomic Layer Deposition; Zinc; Oxide; Pyrolysis; MEMS; Chemistry, Multidisciplinary; Nanoscience & Nanotechnology; Materials; Science, Multidisciplinary; Physics, Applied; Physics, Condensed Matter

    Abstract

    The applicability of atomic layer deposition (ALD) process to the carbon microelectromechanical system technology was studied for a surface modification method of the carbon post electrodes. A conformal coating of the ALD-ZnO film was successfully demonstrated on the carbon post arrays which were fabricated by the traditional photolithography and subsequent two-step pyrolysis. A significant Zn diffusion into the underlying carbon posts was observed during the ALD process. The addition of a sputter-deposited ZnO interfacial layer efficiently blocked the Zn diffusion without altering the microstructure and surface morphology of the ALD-ZnO film.

    Journal Title

    Journal of Nanoscience and Nanotechnology

    Volume

    11

    Issue/Number

    8

    Publication Date

    1-1-2011

    Document Type

    Article; Proceedings Paper

    Language

    English

    First Page

    7322

    Last Page

    7326

    WOS Identifier

    WOS:000295296400126

    ISSN

    1533-4880

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