Monochromatic aberrations in resonant optical elements applied to a focusing multilevel reflectarray
Abbreviated Journal Title
Opt. Express
Keywords
ARRAY; Optics
Abstract
The monochromatic aberrations produced by the phase distribution reflected by resonant sub-wavelength metallic structures are studied both analytically and numerically. Even for normal incidence, the angular dependence of the re-radiated wavefront disturbs the overall performance of the reflectarray. This effect is modelled as combination of a linear and a cubic dependence. A complete numerical simulation of a multilevel focusing reflectarray is performed using computational-electromagnetic and physical-optics-propagation methods. A modified Strehl ratio is defined to show the dependence of the focused spot behavior on aperture. The irradiance distribution is dependent on the polarization state. A small-aperture focusing reflectarray has been designed, fabricated, and tested. The irradiance distribution at the focusing plane is compared with the simulated one, showing a good agreement when residual wavefront aberrations are included.
Journal Title
Optics Express
Volume
18
Issue/Number
11
Publication Date
1-1-2010
Document Type
Article
Language
English
First Page
10931
Last Page
10940
WOS Identifier
ISSN
1094-4087
Recommended Citation
Ginn, James; Alda, Javier; Gómez-Pedrero, José Antonio; and Boreman, Glenn, "Monochromatic aberrations in resonant optical elements applied to a focusing multilevel reflectarray" (2010). Faculty Bibliography 2010s. 187.
https://stars.library.ucf.edu/facultybib2010/187
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